
Base on phase-shifting technique, the laser interferometer,
widely used in the high-precision measurement of planar and
spherical optical components, characterizes the three-dimensional
topography of the measured surface with a precision of 0.06 μm
(Peak-to-valley) or higher .
product parameter
Technical parameters /Product series | Φ300 Phase-Shifting Digital Interferometer | Φ600 Phase-Shifting Digital Interferometer | Φ800 Phase-Shifting Digital Interferometer |
---|---|---|---|
Principle of Measurement | Fizeau Interference | Fizeau Interference | Fizeau Interference |
Aperture of Measurement | 300 mm | 600 mm | 800 mm |
Method of Phase-Shifting | Wavelength Phase-Shifting | Polarization Phase-Shifting or Wavelength Phase-Shifting | Polarization Phase-Shifting or Wavelength Phase-Shifting |
Test Wavelength (±1 nm) | 632.8 nm | 660 nm or 632.8 nm | 660 nm or 632.8 nm |
Wavefront PV error of the transmission flat(TF) | ≤ λ/10 (λ=632.8nm) | ≤ λ/10 (λ=632.8nm) | ≤ λ/10 (λ=632.8nm) |
Wavefront PV error of the reference flat (RF) | ≤ λ/10 (λ=632.8nm) | ≤ λ/10 (λ=632.8nm) | ≤ λ/10 (λ=632.8nm) |
Cavity Error (PV) | ≤ λ/10(λ=632.8nm) | ≤ λ/10(λ=632.8nm) | ≤ λ/10(λ=632.8nm) |
RMS Repeatability | ≤ 1nm (2δ) | ≤ 1nm (2δ) | ≤ 1nm (2δ) |
Resolution of Camera | 2048×2048 | 2048×2048 | 2048×2048 |
Focusing Ability of Camera | √ | √ | √ |
Measurement of High-Parallelism Optical Elements | √ | √ | √ |
Working Temperature Requirements | 22℃ ± 1℃ | 22℃ ± 1℃ | 22℃ ± 1℃ |
Working Tem perature Fluct uation Requirements | < 1° C / hour | < 1° C / hour | < 1° C / hour |
Working Humidity Requirements | 55%±10% R.H. | 55%±10% R.H. | 55%±10% R.H. |
Isolation Requirements | Air-floating Platform: 1 – 2 Hz (Natural Frequency) | Air-floating Platform: 1 – 2 Hz (Natural Frequency) | Air-floating Platform: 1 – 2 Hz (Natural Frequency) |
Power requirements | AC 110 – 220 V, 50/60 Hz | AC 110 – 220 V, 50/60 Hz | AC 110 – 220 V, 50/60 Hz |
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